Product

Yujia spinel 150A/200A

is a 6/8-inch photoresist ashing equipment which is independently designed and developed by Shanghai BangXin: it is built on the BangXin Yujia transmission platform to provide high-speed film transmission efficiency and realize serial or parallel process management; The self-developed high-density plasma generator provides sufficient active reactive groups to ensure high ashing rate; The unique design of gas flow field and thermal field ensures the uniformity of ashing; The operating system that based on database provides fast and stable industrial control as well as high-speed data sampling; The unique wafer lifting mechanism suits more applications.
Application: compound semiconductor / silicon-based integrated circuit

• Bulk photoresist removal
• Photoresist removal after high-energy ion implantation
• Pretreatment processing
• Polymer removal

Honghu TSG150W/200W

is a WCVD equipment for 6/8-inch GaN power semiconductor process independently designed and developed by Shanghai BangXin: it is built on the Honghu multi-chamber cluster vacuum transmission platform independently developed by BangXin, which could provide serial or parallel process management; The process chamber adopts a uniform flow field design to ensure the tungsten film-forming rate and uniformity; The independent heating plate design realizes the adjustable film-forming rate and uniformity.
Application: compound semiconductor tungsten deposition process;

Honghu Ivory150/200

is an ICP etch equipment independently designed and developed by Shanghai BangXin for 6/8-inch compound semiconductor processing process: it is built on the Honghu multi-chamber cluster vacuum transmission platform independently developed by BangXin, which could provide serial or parallel process management; The system adopts optimized ICP coil design to provide higher etching rate and better uniformity; Advanced surface coating is adopted to improve the service life of components, stabilize Particle performance and reduce production cost.
Application:

• Combined semiconductor GaN/SiC etching process
• Compound semiconductor tungsten engraving process

QiJi Spinel300A

is a 12-inch integrated circuit process photoresist ashing equipment independently designed and developed by Shanghai BangXin: it is built on the QiJi multi-chamber cluster vacuum transmission platform independently developed by BangXin, which could provide serial or parallel process management; The self-developed high-density plasma generator provides sufficient active reactive groups to ensure high ashing rate; The unique design of gas flow field and thermal field ensures the uniformity of ashing; The operating system that based on database provides fast and stable industrial control as well as high-speed data sampling; The unique wafer lifting mechanism suits more applications
Application:

• 90nm-14nm integrated circuit
• Photoresist ashing process
• Photoresist removal after high-energy ion implantation
• Pretreatment processing
• Polymer removal